Explanation
Factual.
The different processes involved in the fabrication of an IC are
(I) Epitaxial growth of n or p-type layer, whenever desired. This involves cracking of silane.
(ii) Oxidation which gives a layer of insulating SiO2 and can be used to separate one region of the silicon chip from the other,
(iii)Photolithography is a process in which different regions of silicon chip are cur from different components that can be fabricated in different regions.
(iv) Diffusion of different impurities to obtain different device structure
(v) Metallisation involves deposition of metal films which inter-connect different components on a chip to obtain the circuit
Hence, option (a) is nor involved in fabrication of
IC.
The given symbol is of 'AND' gate.
It is the symbol of 'NOR' gate.
‘NOR’ gates are considered as universal gates, because all the gates like AND, OR, NOT can be obtained by using only NOR gates.
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